Arsenic Trisulfide Inorganic Photoresist for Three-Dimensional Photolithography

The aim of this thesis is to investigate and develop a material that has both a high refractive index and spatially localizable photoluminescence while being processable like a conventional photoresist, so that it can be used with the 3D direct laser writing technique. The result obtained shows that this has been reduced to practice to enable the creation of 3D photonic crystals with full-photonic bandgaps, and the opportunity to incorporate photoluminescent guests at specific locations.