KIT | KIT-Bibliothek | Impressum | Datenschutz
Open Access Logo
§
Verlagsausgabe
DOI: 10.5445/IR/1000027145
Veröffentlicht am 24.05.2018
Originalveröffentlichung
DOI: 10.1364/OME.1.000883
Scopus
Zitationen: 37
Web of Science
Zitationen: 37

Spectroscopic characterization of highly doped ZnO films grown by atomic-layer deposition for three-dimensional infrared metamaterials

Frölich, A.; Wegener, M.

Abstract:
We systematically study the optical spectra of ZnO grown by atomic-layer deposition as a function of Al (and Ti) doping concentration. The spectra measured on films are well described by fits using a Drude free-electron model. The derived plasma frequencies are consistent with the expected amount of doping and can be continuously and controllably tuned from small values to about 400 THz. The losses (damping) are also quantified. In addition, we achieve smooth conformal coatings of three-dimensional polymer templates made by direct laser writing. Altogether, Al:ZnO appears as an attractive "tunable metal" for three-dimensional infrared metamaterials or transformation-optics architectures.


Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Publikationstyp Zeitschriftenaufsatz
Jahr 2011
Sprache Englisch
Identifikator ISSN: 2159-3930
URN: urn:nbn:de:swb:90-271453
KITopen ID: 1000027145
Erschienen in Optical materials express
Band 1
Heft 5
Seiten 883 - 889
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft KITopen Landing Page