KIT | KIT-Bibliothek | Impressum | Datenschutz

Spectroscopic characterization of highly doped ZnO films grown by atomic-layer deposition for three-dimensional infrared metamaterials

Frölich, A. 1,2; Wegener, M. 3
1 DFG Forschungszentrum für funktionelle Nanostrukturen der Universität Karlsruhe (TH) (ZFN), Karlsruher Institut für Technologie (KIT)
2 Center for Functional Nanostructures (CFN), Karlsruher Institut für Technologie (KIT)
3 Karlsruher Institut für Technologie (KIT)

Abstract:

We systematically study the optical spectra of ZnO grown by atomic-layer deposition as a function of Al (and Ti) doping concentration. The spectra measured on films are well described by fits using a Drude free-electron model. The derived plasma frequencies are consistent with the expected amount of doping and can be continuously and controllably tuned from small values to about 400 THz. The losses (damping) are also quantified. In addition, we achieve smooth conformal coatings of three-dimensional polymer templates made by direct laser writing. Altogether, Al:ZnO appears as an attractive "tunable metal" for three-dimensional infrared metamaterials or transformation-optics architectures.


Verlagsausgabe §
DOI: 10.5445/IR/1000027145
Veröffentlicht am 24.05.2018
Originalveröffentlichung
DOI: 10.1364/OME.1.000883
Scopus
Zitationen: 43
Web of Science
Zitationen: 40
Dimensions
Zitationen: 43
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2011
Sprache Englisch
Identifikator ISSN: 2159-3930
urn:nbn:de:swb:90-271453
KITopen-ID: 1000027145
Erschienen in Optical materials express
Verlag Optica Publishing Group (OSA)
Band 1
Heft 5
Seiten 883 - 889
Nachgewiesen in Dimensions
Scopus
Web of Science
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page