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Verlagsausgabe
DOI: 10.5445/IR/1000027331
Veröffentlicht am 08.03.2018
Originalveröffentlichung
DOI: 10.1364/OE.19.011529
Scopus
Zitationen: 73
Web of Science
Zitationen: 69

Reduced propagation loss in silicon strip and slot waveguides coated by atomic layer deposition

Alasaarela, T.; Korn, D.; Alloatti, L.; Säynätjoki, A.; Tervonen, A.; Palmer, R.; Leuthold, J.; Freude, W.; Honkanen, S.

Abstract:
When silicon strip and slot waveguides are coated with a 50nm amorphous titanium dioxide (TiO2) film, measured losses at a wavelength of 1.55μm can be as low as (2±1)dB/cm and (7±2)dB/cm, respectively. We use atomic layer deposition (ALD), estimate the effect of ALD growth on the surface roughness, and discuss the effect on the scattering losses. Because the gap between the rails of a slot waveguide narrows by the TiO2 deposition, the effective slot width can be back-end controlled. This is useful for precise adjustment if the slot is to be filled with, e. g., a nonlinear organic material or with a sensitizer for sensors applications.


Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Institut für Organische Chemie (IOC)
Publikationstyp Zeitschriftenaufsatz
Jahr 2011
Sprache Englisch
Identifikator ISSN: 1094-4087
URN: urn:nbn:de:swb:90-273319
KITopen ID: 1000027331
HGF-Programm 43.14.03; LK 01
Erschienen in Optics express
Band 19
Heft 12
Seiten 11529-11538
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