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DOI: 10.5445/IR/1000039571

Silica in humid air environment (I): Diffusion in the absence of stresses. Open Access at KIT

Fett, Theo; Wiederhorn, Sheldon M.

Abstract:
Diffusion of water into silica results in diffusion zones near the silica surface. Due to the chemical reaction between H2O and SiO2 the material expands, i.e. swelling takes place. Since the unaffected bulk material suppresses free expansion, biaxial compressive swelling stresses will occur near the surface. For constant concentrations of molecular water at the surface, we already outlined the problem in earlier papers.


Zugehörige Institution(en) am KIT Fakultät für Physik (PHYSIK)
Institut für Angewandte Materialien - Keramik im Maschinenbau (IAM-KM)
Publikationstyp Forschungsbericht
Jahr 2014
Sprache Englisch
Identifikator ISSN: 2194-1629
URN: urn:nbn:de:swb:90-395716
KITopen ID: 1000039571
Verlag KIT, Karlsruhe
Umfang 15 S.
Serie KIT Scientific Working Papers ; 11
Schlagworte Silica, diffusion, time-dependence, swelling
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