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Monitoring the film formation during sputter deposition of vanadium carbide by in situ X-ray reflectivity measurements

Kaufholz, Marthe

For optimizing the properties of magnetron sputtered coatings, the relation between the deposition conditions, microstructure formation, and mechanical properties has to be understood. Here, monitoring the material distribution during growth can give valuable information. In situ X-Ray Reflectivity measurements were performed, optimized for hard coating materials and applied to study the film formation of vanadium carbide. The gained knowledge was used to successfully create multilayer systems.

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Volltext §
DOI: 10.5445/IR/1000045319
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Photonenforschung und Synchrotronstrahlung (IPS)
Publikationstyp Hochschulschrift
Publikationsjahr 2014
Sprache Englisch
Identifikator urn:nbn:de:swb:90-453190
KITopen-ID: 1000045319
Verlag KIT, Karlsruhe
Art der Arbeit Dissertation
Fakultät Fakultät für Physik (PHYSIK)
Institut Institut für Photonenforschung und Synchrotronstrahlung (IPS)
Prüfungsdaten 21.11.2014
Referent/Betreuer Prof. T. Baumbach
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
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