KIT | KIT-Bibliothek | Impressum

Fully ultrahigh-vacuum-compatible fabrication of submicrometer-spaced electrical contacts

Gärtner, C.; Hoffman, R.; Pérez-Willard, F.; Sauter, M.; Sürgers, Christoph; Löhneysen, Hilbert von

Abstract: We present an approach by which submicrometer-spaced electrical contacts can be fabricated on virtually any surface under ultrahigh-vacuum conditions. The metallic contacts are formed by subsequent deposition through a macroscopic mask and a nanostructured stencil mask. The stencil mask with a high aspect ratio was obtained by nanopatterning of suspended low-stress Si3+xN4−x membranes with a focused ion-beam system. The fabricated contacts can be electrically connected in situ by simply exchanging the mask carrier by a second, spring-loaded, carrier.


Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Institut für Festkörperphysik (IFP)
Publikationstyp Zeitschriftenaufsatz
Jahr 2006
Sprache Englisch
Identifikator DOI: 10.1063/1.2163973
ISSN: 0034-6748
KITopen ID: 1000050517
HGF-Programm 52.01.01; LK 01
Erschienen in Review of Scientific Instruments
Band 77
Heft 2
Seiten 026101/1-3
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft KITopen Landing Page