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Fully ultrahigh-vacuum-compatible fabrication of submicrometer-spaced electrical contacts

Gärtner, C.; Hoffman, R.; Pérez-Willard, F.; Sauter, M.; Sürgers, Christoph; Löhneysen, Hilbert von

Abstract:
We present an approach by which submicrometer-spaced electrical contacts can be fabricated on virtually any surface under ultrahigh-vacuum conditions. The metallic contacts are formed by subsequent deposition through a macroscopic mask and a nanostructured stencil mask. The stencil mask with a high aspect ratio was obtained by nanopatterning of suspended low-stress Si3+xN4−x membranes with a focused ion-beam system. The fabricated contacts can be electrically connected in situ by simply exchanging the mask carrier by a second, spring-loaded, carrier.



Originalveröffentlichung
DOI: 10.1063/1.2163973
Scopus
Zitationen: 4
Web of Science
Zitationen: 6
Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Institut für Festkörperphysik (IFP)
Publikationstyp Zeitschriftenaufsatz
Jahr 2006
Sprache Englisch
Identifikator ISSN: 0034-6748, 1089-7623
KITopen-ID: 1000050517
HGF-Programm 52.01.01 (POF I, LK 01)
Erschienen in Review of scientific instruments
Band 77
Heft 2
Seiten Art.Nr. 026101
Nachgewiesen in Web of Science
Scopus
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