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Fully ultrahigh-vacuum-compatible fabrication of submicrometer-spaced electrical contacts

Gärtner, C. 1; Hoffman, R. 1; Pérez-Willard, F.; Sauter, M. 1; Sürgers, Christoph 1; Löhneysen, Hilbert von 1,2
1 Universität Karlsruhe (TH)
2 Forschungszentrum Karlsruhe (FZKA)

Abstract:
We present an approach by which submicrometer-spaced electrical contacts can be fabricated on virtually any surface under ultrahigh-vacuum conditions. The metallic contacts are formed by subsequent deposition through a macroscopic mask and a nanostructured stencil mask. The stencil mask with a high aspect ratio was obtained by nanopatterning of suspended low-stress Si3+xN4−x membranes with a focused ion-beam system. The fabricated contacts can be electrically connected in situ by simply exchanging the mask carrier by a second, spring-loaded, carrier.


Originalveröffentlichung
DOI: 10.1063/1.2163973
Scopus
Zitationen: 4
Dimensions
Zitationen: 5
Zugehörige Institution(en) am KIT Institut für Festkörperphysik (IFP)
Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2006
Sprache Englisch
Identifikator ISSN: 0034-6748, 1089-7623
KITopen-ID: 1000050517
HGF-Programm 52.01.01 (POF I, LK 01) Elektr.Eigenschaften.Magnetismus u.SL
Erschienen in Review of scientific instruments
Verlag American Institute of Physics (AIP)
Band 77
Heft 2
Seiten Art.Nr. 026101
Nachgewiesen in Web of Science
Scopus
Dimensions
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