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Efficient numerical simulation and optimization in electrophoretic deposition processes

Keller, Florian 1; Nirschl, Hermann 1; Dörfler, Willy ORCID iD icon 2; Woldt, Erik
1 Institut für Mechanische Verfahrenstechnik und Mechanik (MVM), Karlsruher Institut für Technologie (KIT)
2 Institut für Angewandte und Numerische Mathematik (IANM), Karlsruher Institut für Technologie (KIT)

Abstract:

Electrophoretic deposition plays a major role in many industrial coating processes. However it is observed that the usage of the standard electrophoretic deposition process with one counter electrode leads to an inhomogeneous layer thickness distribution on the workpiece. In this article it is shown by numerical methods that segmented counter-electrodes with individual potential differences can be successfully used to reduce the amount of coating material in the process. For the optimisation an efficient mathematical model with a thin layer approximation is introduced. Therein it is especially necessary to model the effect of the deposited layer on the applied electric field. So the aim of this work is on the one hand, to extend the existing models to arbitrary non-planar geometries in three space dimensions, and on the other hand to apply this model for the optimisation of industrial coating processes. (C) 2015 Elsevier Ltd. All rights reserved.


Originalveröffentlichung
DOI: 10.1016/j.jeurceramsoc.2015.02.031
Scopus
Zitationen: 11
Web of Science
Zitationen: 10
Dimensions
Zitationen: 11
Zugehörige Institution(en) am KIT Institut für Angewandte und Numerische Mathematik (IANM)
Institut für Mechanische Verfahrenstechnik und Mechanik (MVM)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2015
Sprache Englisch
Identifikator ISSN: 0955-2219
KITopen-ID: 1000050608
Erschienen in Journal of the European Ceramic Society
Verlag Elsevier
Band 35
Heft 9
Seiten 2619-2630
Nachgewiesen in Dimensions
Scopus
Web of Science
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