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Manipulation of growth modes in heteroepitaxy: Ni/Cu(111)

Wulfhekel, W.; Beckmann, I.; Lipkin, N. N.; Rosenfeld, G.; Poelsema, B.; Comsa, G.

Abstract:
Growth manipulation methods, which have been successfully used to improve the growth of homoepitaxial films, are applied to molecular beam epitaxy of the heteroepitaxial system Ni/Cu(111). The procedures applied are temperature reduction during nucleation and pulsed ion bombardment during deposition. While the first does not lead to smoother films, the ion beam assisted growth is successful in reducing the film roughness. (C) 1996 American Institute of Physics.

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Originalveröffentlichung
DOI: 10.1063/1.117222
Scopus
Zitationen: 13
Web of Science
Zitationen: 12
Seitenaufrufe: 14
seit 30.05.2018
Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Jahr 1996
Sprache Englisch
Identifikator ISSN: 0003-6951
KITopen-ID: 1000053852
Erschienen in Applied Physics Letters
Band 69
Heft 23
Seiten 3492--3494
Nachgewiesen in Scopus
Web of Science
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