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Magnetic anisotropy of Co on Cu(1 1 17)

Wulfhekel, W.; Knappmann, S.; Oepen, H. P.

The in-plane magnetic anisotropy of ultra-thin Co films, epitaxially grown on Cu(1 1 17), was determined in situ by means of the magneto-optic Kerr effect down to thicknesses as low as 2 monolayers. Uniaxial and biaxial anisotropy contributions were observed. At room temperature, the uniaxial component is dominant and the easy axis of magnetization is parallel to the step edges. Above 4 monolayers the magnetic anisotropy exhibits a thickness dependence which can be described by volume and interface contributions. For thinner films a pronounced deviation from that behavior is found. The anisotropy drops abruptly by one order of magnitude below 3 monolayers. Thickness dependent relaxations are proposed as driving forces for that behavior. (C) 1996 American Institute of Physics.

DOI: 10.1063/1.360884
Zitationen: 36
Web of Science
Zitationen: 35
Seitenaufrufe: 14
seit 30.05.2018
Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Jahr 1996
Sprache Englisch
Identifikator ISSN: 0021-8979
KITopen-ID: 1000053861
Erschienen in Journal of Applied Physics
Band 79
Heft 2
Seiten 988-992
Nachgewiesen in Web of Science
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