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DOI: 10.1063/1.360884
Zitationen: 36
Web of Science
Zitationen: 35

Magnetic anisotropy of Co on Cu(1 1 17)

Wulfhekel, W.; Knappmann, S.; Oepen, H. P.

The in-plane magnetic anisotropy of ultra-thin Co films, epitaxially grown on Cu(1 1 17), was determined in situ by means of the magneto-optic Kerr effect down to thicknesses as low as 2 monolayers. Uniaxial and biaxial anisotropy contributions were observed. At room temperature, the uniaxial component is dominant and the easy axis of magnetization is parallel to the step edges. Above 4 monolayers the magnetic anisotropy exhibits a thickness dependence which can be described by volume and interface contributions. For thinner films a pronounced deviation from that behavior is found. The anisotropy drops abruptly by one order of magnitude below 3 monolayers. Thickness dependent relaxations are proposed as driving forces for that behavior. (C) 1996 American Institute of Physics.

Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Jahr 1996
Sprache Englisch
Identifikator ISSN: 0021-8979
KITopen-ID: 1000053861
Erschienen in Journal of Applied Physics
Band 79
Heft 2
Seiten 988-992
Nachgewiesen in Web of Science
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