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Lasing in silicon-organic hybrid waveguides

Korn, D.; Lauermann, M.; Koeber, S.; Appel, P.; Alloatti, L.; Palmer, R.; Dumon, P.; Freude, W.; Leuthold, J.; Koos, C.

Abstract (englisch):
Silicon photonics enables large-scale photonic–electronic integration by leveraging highly developed fabrication processes from the microelectronics industry. However, while a rich portfolio of devices has already been demonstrated on the silicon platform, on-chip light sources still remain a key challenge since the indirect bandgap of the material inhibits efficient photon emission and thus impedes lasing. Here we demonstrate a class of infrared lasers that can be fabricated on the silicon-on-insulator (SOI) integration platform. The lasers are based on the silicon–organic hybrid (SOH) integration concept and combine nanophotonic SOI waveguides with dye-doped organic cladding materials that provide optical gain. We demonstrate pulsed room-temperature lasing with on-chip peak output powers of up to 1.1 W at a wavelength of 1,310 nm. The SOH approach enables efficient mass-production of silicon photonic light sources emitting in the near infrared and offers the possibility of tuning the emission wavelength over a wide range by proper choice of dye materials and resonator geometry.

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Volltext §
DOI: 10.5445/IR/1000053972
Originalveröffentlichung
DOI: 10.1038/ncomms10864
Scopus
Zitationen: 24
Web of Science
Zitationen: 18
Coverbild
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Institut für Photonik und Quantenelektronik (IPQ)
Publikationstyp Zeitschriftenaufsatz
Jahr 2016
Sprache Englisch
Identifikator ISSN: 2041-1723
urn:nbn:de:swb:90-539725
KITopen-ID: 1000053972
HGF-Programm 43.23.03 (POF III, LK 01)
Erschienen in Nature Communications
Band 7
Seiten 10864
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Schlagworte Physical sciences; Applied physics; Materials science; Optical physics
Nachgewiesen in Scopus
Web of Science
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