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Lasing in silicon-organic hybrid waveguides

Korn, D.; Lauermann, M.; Koeber, S.; Appel, P.; Alloatti, L.; Palmer, R.; Dumon, P.; Freude, W.; Leuthold, J.; Koos, C.

Abstract (englisch): Silicon photonics enables large-scale photonic–electronic integration by leveraging highly developed fabrication processes from the microelectronics industry. However, while a rich portfolio of devices has already been demonstrated on the silicon platform, on-chip light sources still remain a key challenge since the indirect bandgap of the material inhibits efficient photon emission and thus impedes lasing. Here we demonstrate a class of infrared lasers that can be fabricated on the silicon-on-insulator (SOI) integration platform. The lasers are based on the silicon–organic hybrid (SOH) integration concept and combine nanophotonic SOI waveguides with dye-doped organic cladding materials that provide optical gain. We demonstrate pulsed room-temperature lasing with on-chip peak output powers of up to 1.1 W at a wavelength of 1,310 nm. The SOH approach enables efficient mass-production of silicon photonic light sources emitting in the near infrared and offers the possibility of tuning the emission wavelength over a wide range by proper choice of dye materials and resonator geometry.

Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Institut für Photonik und Quantenelektronik (IPQ)
Publikationstyp Zeitschriftenaufsatz
Jahr 2016
Sprache Englisch
Identifikator DOI: 10.1038/ncomms10864
ISSN: 2041-1723
URN: urn:nbn:de:swb:90-539725
KITopen ID: 1000053972
HGF-Programm 43.23.03; LK 01
Erschienen in Nature Communications
Band 7
Seiten 10864
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Schlagworte Physical sciences; Applied physics; Materials science; Optical physics
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