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Refraction limit of miniaturized optical systems: A ball-lens example

Kim, M.-S.; Scharf, T.; Mühlig, S.; Fruhnert, M. 1; Rockstuhl, C. 1,2; Bitterli, R.; Noell, W.; Voelkel, R.; Herzig, H. P.
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)

Abstract (englisch):

We study experimentally and theoretically the electromagnetic field in amplitude and phase behind ball-lenses across a wide range of diameters, ranging from a millimeter scale down to a micrometer. Based on the observation, we study the transition between the refraction and diffraction regime. The former regime is dominated by observables for which it is sufficient to use a ray-optical picture for an explanation, e.g., a cusp catastrophe and caustics. A wave-optical picture, i.e. Mie theory, is required to explain the features, e.g., photonic nanojets, in the latter regime. The vanishing of the cusp catastrophe and the emergence of the photonic nanojet is here understood as the refraction limit. Three different criteria are used to identify the limit: focal length, spot size, and amount of cross-polarization generated in the scattering process. We identify at a wavelength of 642 nm and while considering ordinary glass as the ball-lens material, a diameter of approximately 10 µm as the refraction limit. With our study, we shed new light on the means necessary to describe micro-optical system. This is useful when designing optical devices for imaging or illumination.

Volltext §
DOI: 10.5445/IR/1000054538
DOI: 10.1364/OE.24.006996
Zitationen: 28
Web of Science
Zitationen: 27
Zitationen: 28
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2016
Sprache Englisch
Identifikator ISSN: 1094-4087
KITopen-ID: 1000054538
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Optics Express
Verlag Optica Publishing Group (OSA)
Band 24
Heft 7
Seiten 6996-7005
Nachgewiesen in Dimensions
Web of Science
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