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Objects of Maximum Electromagnetic Chirality

Fernandez-Corbaton, Ivan ORCID iD icon 1; Fruhnert, Martin 2; Rockstuhl, Carsten ORCID iD icon 1
1 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)
2 Karlsruher Institut für Technologie (KIT)

Abstract (englisch):

We introduce a definition of the electromagnetic chirality of an object and show that it has an upper bound. Reciprocal objects attain the upper bound if and only if they are transparent for all the fields of one polarization handedness (helicity). Additionally, electromagnetic duality symmetry, i.e., helicity preservation upon interaction, turns out to be a necessary condition for reciprocal objects to attain the upper bound. We use these results to provide requirements for the design of such extremal objects. The requirements can be formulated as constraints on the polarizability tensors for dipolar objects or on the material constitutive relations for continuous media. We also outline two applications for objects of maximum electromagnetic chirality: a twofold resonantly enhanced and background-free circular dichroism measurement setup, and angle-independent helicity filtering glasses. Finally, we use the theoretically obtained requirements to guide the design of a specific structure, which we then analyze numerically and discuss its performance with respect to maximal electromagnetic chirality.


Volltext §
DOI: 10.5445/IR/1000059372
Originalveröffentlichung
DOI: 10.1103/PhysRevX.6.031013
Scopus
Zitationen: 106
Web of Science
Zitationen: 95
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Zitationen: 108
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2016
Sprache Englisch
Identifikator ISSN: 2160-3308
urn:nbn:de:swb:90-593726
KITopen-ID: 1000059372
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Physical review / X
Verlag American Physical Society (APS)
Band 6
Heft 3
Seiten Art.Nr.:031013
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Nachgewiesen in Web of Science
Dimensions
Scopus
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