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Polymer compound refractive lenses for hard X-ray nanofocusing

Christina Krywka, Arndt Last, Felix Marschall, Ottó Márkus, Sebastian Georgi, Martin Müller, Jürgen Mohr

Abstract (englisch):
Compound refractive lenses fabricated out of SU-8 negative photoresist have been used to generate a nanofocused, i.e. sub-µm sized X-ray focal spot at an X-ray nanodiffraction setup. X-ray microscopy and X-ray diffraction techniques have conceptually different demands on nanofocusing optical elements and so with the application of X-ray nanodiffraction in mind, this paper presents the results of an initial characterization of polymer lenses used as primary focusing device at an X-ray nanodiffraction synchrotron beamline. A beam size of ∼ 600 nm was achieved at a photon energy of 13 keV following only a short initial alignment, with the focal spot representing a demagnified, direct image of the undulator source.


Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Publikationstyp Zeitschriftenaufsatz
Jahr 2016
Sprache Englisch
Identifikator DOI: 10.1063/1.4961129
ISSN: 0094-243X, 1551-7616
KITopen ID: 1000063501
HGF-Programm 43.23.02; LK 01
Erschienen in AIP conference proceedings
Band 1764
Heft 1
Seiten Art. Nr. 020001
Bemerkung zur Veröffentlichung http://aip.scitation.org/doi/abs/10.1063/1.4961129
Schlagworte X-ray diffraction, X-ray microscopy, LensesHard X-rays, Nanodiffraction
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