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Large area gratings by x-ray LIGA dynamic exposure for x-ray phase-contrast imaging

Schröter, Tobias J.; Koch, Frieder; Meyer, Pascal; Baumann, Martin; Münch, Daniel; Kunka, Danays; Engelhardt, Sabine; Zuber, Marcus; Baumbach, Tilo; Mohr, Jürgen

Abstract (englisch):
X-ray differential phase-contrast imaging (DPCI) using a Talbot–Lau interferometer at a conventional tube source has continuously found applications since its first demonstration. It requires high aspect ratio grating structures with a feature size in the micrometer range that are fabricated using lithographie, galvanik und abformung technology. To overcome the current limitation in grating area, an exposure strategy—continuous exposure—has been developed. In this case, the mask is fixed in respect to the synchrotron beam and only the substrate is scanned. Thus, the grating area is given by the scanning length which is much larger than the actual mask size. The design, needs, and tolerances to adopt this process of dynamic exposure will be described. Furthermore, the first tests using this method will be presented. Gratings with a metal aspect ratio of 11 and a period of 10  μm were fabricated on an area of 165  mm×65  mm. First imaging results demonstrate the suitability of this method. No differences in the visibility or in x-ray image compared to gratings fabricated by the standard method could be found.


Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Laboratorium für Applikationen der Synchrotronstrahlung (LAS)
Institut für Photonenforschung und Synchrotronstrahlung (IPS)
Publikationstyp Zeitschriftenaufsatz
Jahr 2017
Sprache Englisch
Identifikator DOI: 10.1117/1.JMM.16.1.013501
ISSN: 1537-1646, 1932-5134, 1932-5150
KITopen ID: 1000065524
HGF-Programm 43.23.02; LK 01
Erschienen in Journal of micro/nanolithography, MEMS and MOEMS
Band 16
Heft 1
Seiten 013501
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