KIT | KIT-Bibliothek | Impressum | Datenschutz

Photo-structurable polymer for interlayer single-mode waveguide fabrication by femtosecond laser writing

Nguyen, Ho Hoai Duc; Hollenbach, Uwe; Pfirrmann, Stefan; Ostrzinski, Ute; Pfeiffer, Karl; Hengsbach, Stefan; Mohr, Juergen

Abstract (englisch):
We present the fabrication and characterization of inter-layer single-mode light-guiding structures in a newly developed photo-structurable polymer via femtosecond laser writing. A host-guest polymer system utilizing external diffusion induces permanent and high refractive index modulation. Analyzing the complete curing and the impact of external diffusion on refractive index profile helps optimize the fabrication process. The fabrications of 4 × 2 array interconnect and 3-waveguide core fan-out device involve only a single layer, and need no stacking or alignment effort. The resulting pitch size and crosstalk between single-mode waveguides are 25 μm and −34 dB, respectively. Adding sensitizer into the photopolymer to increase its sensitivity in two-photon polymerization at a writing wavelength of 390 nm reduces the surface roughness of written structures by a factor of seven.

DOI: 10.1016/j.optmat.2017.01.037
Zitationen: 4
Web of Science
Zitationen: 4
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Karlsruhe Nano Micro Facility (KNMF)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2017
Sprache Englisch
Identifikator ISSN: 0925-3467, 1873-1252
KITopen-ID: 1000065529
HGF-Programm 43.23.01 (POF III, LK 01)
Advanced Optical Lithography+Microscopy
Erschienen in Optical materials
Band 66
Seiten 110–116
Schlagwörter 3D direct laser writing; Two-photon polymerization (2PP); Photopolymer; Waveguide arrays; Fan-in/fan-out; Compact pitch size
Nachgewiesen in Web of Science
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page