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Support of Design engineering activity through the Contact and Channel Model-the importance of a continous and systematic model building; The Application of Design Process Patterns exemplified by the C&CM Sequence Model; C&CM as a supporting modell in designing activities exemplified through an industrial example; Interdisciplinary development based on a comprehensive process model;

Albers, Albert; Alink, Tobias; Deigendesch, Tobias



Zugehörige Institution(en) am KIT Institut für Produktentwicklung (IPEK)
Publikationstyp Proceedingsband
Jahr 2008
Sprache Englisch
Identifikator ISBN: 978-3-938843-40-6
ISSN: 1619-4098
KITopen ID: 1000067620
Verlag ISLE, Ilmenau
Serie Internationales wissenschaftliches Kolloquium ; 53
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