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Copper atomic-scale transistors

Xie, Fangqing 1; Kavalenka, Maryna N. 2; Röger, Moritz 2; Albrecht, Daniel 1; Hölscher, Hendrik ORCID iD icon 2; Leuthold, Jürgen; Schimmel, Thomas 1,3
1 Institut für Angewandte Physik (APH), Karlsruher Institut für Technologie (KIT)
2 Institut für Mikrostrukturtechnik (IMT), Karlsruher Institut für Technologie (KIT)
3 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)

Abstract (englisch):

We investigated copper as a working material for metallic atomic-scale transistors and confirmed that copper atomic-scale transistors can be fabricated and operated electrochemically in a copper electrolyte (CuSO4 + H2SO4) in bi-distilled water under ambient conditions with three microelectrodes (source, drain and gate). The electrochemical switching-on potential of the atomic-scale transistor is below 350 mV, and the switching-off potential is between 0 and −170 mV. The switching-on current is above 1 μA, which is compatible with semiconductor transistor devices. Both sign and amplitude of the voltage applied across the source and drain electrodes (Ubias) influence the switching rate of the transistor and the copper deposition on the electrodes, and correspondingly shift the electrochemical operation potential. The copper atomic-scale transistors can be switched using a function generator without a computer-controlled feedback switching mechanism. The copper atomic-scale transistors, with only one or two atoms at the narrowest constriction, were realized to switch between 0 and 1G0 (G0 = 2e2/h; with e being the electron charge, and h being Planck’s constant) or 2G0 by the function generator. ... mehr


Verlagsausgabe §
DOI: 10.5445/IR/1000067834
Veröffentlicht am 19.11.2018
Originalveröffentlichung
DOI: 10.3762/bjnano.8.57
Scopus
Zitationen: 9
Web of Science
Zitationen: 7
Dimensions
Zitationen: 9
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Mikrostrukturtechnik (IMT)
Institut für Nanotechnologie (INT)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2017
Sprache Englisch
Identifikator ISSN: 2190-4286
urn:nbn:de:swb:90-678340
KITopen-ID: 1000067834
HGF-Programm 43.22.01 (POF III, LK 01) Functionality by Design
Erschienen in Beilstein journal of nanotechnology
Verlag Beilstein-Institut
Band 8
Seiten 530–538
Bemerkung zur Veröffentlichung http://www.beilstein-journals.org/bjnano/single/articleFullText.htm?publicId=2190-4286-8-57
Schlagwörter electrochemistry; encapsulation; metallic atomic-scale transistor; nanotechnology; photolithography; 2014-013-005434 DLW
Nachgewiesen in Scopus
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Web of Science
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