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On the determination of Χ(2) in thin films: A comparison of one-beam second-harmonic generation measurement methodologies

Hermans, A.; Kieninger, C. 1,2; Koskinen, K.; Wickberg, A. 3; Solano, E.; Dendooven, J.; Kauranen, M. 3; Clemmen, S.; Wegener, M. 4; Koos, C. 1,2; Baets, R.
1 Institut für Photonik und Quantenelektronik (IPQ), Karlsruher Institut für Technologie (KIT)
2 Institut für Mikrostrukturtechnik (IMT), Karlsruher Institut für Technologie (KIT)
3 Institut für Angewandte Physik (APH), Karlsruher Institut für Technologie (KIT)
4 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)


The determination of the second-order susceptibility (χ(2)) of thin film samples can be a delicate matter since well-established χ(2) measurement methodologies such as the Maker fringe technique are best suited for nonlinear materials with large thicknesses typically ranging from tens of microns to several millimeters. Here we compare two different second-harmonic generation setups and the corresponding measurement methodologies that are especially advantageous for thin film χ(2) characterization. This exercise allows for cross-checking the χ(2) obtained for identical samples and identifying the main sources of error for the respective techniques. The development of photonic integrated circuits makes nonlinear thin films of particular interest, since they can be processed into long waveguides to create efficient nonlinear devices. The investigated samples are ABC-type nanolaminates, which were reported recently by two different research groups. However, the subsequent analysis can be useful for all researchers active in the field of thin film χ(2) characterization.

Verlagsausgabe §
DOI: 10.5445/IR/1000069016
Veröffentlicht am 27.02.2018
DOI: 10.1038/srep44581
Zitationen: 22
Web of Science
Zitationen: 20
Zitationen: 23
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Mikrostrukturtechnik (IMT)
Institut für Nanotechnologie (INT)
Institut für Photonik und Quantenelektronik (IPQ)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2017
Sprache Englisch
Identifikator ISSN: 2045-2322
KITopen-ID: 1000069016
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Scientific reports
Verlag Nature Research
Band 7
Seiten Art.-Nr.: 44581
Nachgewiesen in Dimensions
Web of Science
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