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X-ray Phase-Contrast Imaging and Metrology through Unified Modulated Pattern Analysis

Zdora, Marie-Christine; Thibault, Pierre; Zhou, Tunhe; Koch, Frieder J.; Romell, Jenny; Sala, Simone; Last, Arndt; Rau, Christoph; Zanette, Irene

Abstract (englisch):
We present a method for x-ray phase-contrast imaging and metrology applications based on the sample-induced modulation and subsequent computational demodulation of a random or periodic reference interference pattern. The proposed unified modulated pattern analysis (UMPA) technique is a versatile approach and allows tuning of signal sensitivity, spatial resolution, and scan time. We characterize the method and demonstrate its potential for high-sensitivity, quantitative phase imaging, and metrology to overcome the limitations of existing methods.

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Originalveröffentlichung
DOI: 10.1103/PhysRevLett.118.203903
Scopus
Zitationen: 14
Web of Science
Zitationen: 13
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Publikationstyp Zeitschriftenaufsatz
Jahr 2017
Sprache Englisch
Identifikator ISSN: 0031-9007, 1079-7114, 1092-0145
KITopen-ID: 1000070120
HGF-Programm 43.23.02 (POF III, LK 01)
Erschienen in Physical review letters
Band 118
Heft 20
Seiten Art.Nr. 203903
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