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Originalveröffentlichung
DOI: 10.1016/j.mseb.2017.06.013
Scopus
Zitationen: 1
Web of Science
Zitationen: 1

Study on silicon nanopillars with ultralow broadband reflectivity via maskless reactive ion etching at room temperature

Huang, Yi; Yan, Wensheng; Tan, Xinyu; He, Lijun

Abstract:
Nanostructured silicon with low surface reflectivity has important application prospects in a wide range. We fabricate crystalline silicon nanopillars with ultralow broadband reflectivity via maskless reactive ion etching at room temperature. The measurements show that the silicon nanopillars are in nano-scale diameter and micron-scale height with tip ends, which show extremely powerful antireflection capability. The silicon nanopillars with the heights of 5 μm and 7 μm demonstrate ultralow weighted average reflectivity of 0.80% and 0.40%, respectively, in a wide wavelength range of 300-1030 nm. Additional SiNx coating reduces the reflectivity to 0.09%. The two-dimensional weighted average reflectivity as function of angle of incidence and wavelength is measured, which shows low sensitivity to angle of incidence in the range of 0°-70°. The calculated wavelength dependent reflectance is in good agreement with the measured result in the range of 300-1030 nm.


Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Karlsruhe Nano Micro Facility (KNMF)
Publikationstyp Zeitschriftenaufsatz
Jahr 2017
Sprache Englisch
Identifikator ISSN: 0921-5107, 1873-4944
KITopen ID: 1000071761
HGF-Programm 43.23.04; LK 01
Erschienen in Materials science and engineering / B
Band 223
Seiten 153-158
URLs Link
Schlagworte Silicon nanopillars, Ultralow broadband reflectivity, Room-temperature fabrication
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