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Originalveröffentlichung
DOI: 10.1109/77.783894
Scopus
Zitationen: 18
Web of Science
Zitationen: 15

Narrow long Josephson junctions

Koval, Yu.; Wallraff, A.; Fistul, M.; Thyssen, N.; Kohlstedt, H.; Ustinov, A.V.

Abstract:
Long Josephson junctions of width down to less than 0.3 /spl mu/m are fabricated using electron beam lithography. The junctions are made in niobium-aluminum-oxide trilayer technology using cross-linked PMMA for insulation. We measured the fluxon penetration field, the magnetic field period of the critical current modulation, and the Fiske step voltages of the junctions. A strong dependence of these quantities on the junction width is observed. Assuming a general-type relation between the spatial derivative of the phase and the spatial variation of the magnetic field along the plane of the junction, we derive a scaling relation between the measured quantities depending on the junction width. The derived relation is consistent with the experimental data.


Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Jahr 1999
Sprache Englisch
Identifikator ISSN: 1051-8223, 1558-2515
KITopen-ID: 1000074492
Erschienen in IEEE transactions on applied superconductivity
Band 9
Heft 2
Seiten 3957-3961
Nachgewiesen in Web of Science
Scopus
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