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Narrow long Josephson junctions

Koval, Yu.; Wallraff, A.; Fistul, M.; Thyssen, N.; Kohlstedt, H.; Ustinov, A. V.


Long Josephson junctions of width down to less than 0.3 /spl mu/m are fabricated using electron beam lithography. The junctions are made in niobium-aluminum-oxide trilayer technology using cross-linked PMMA for insulation. We measured the fluxon penetration field, the magnetic field period of the critical current modulation, and the Fiske step voltages of the junctions. A strong dependence of these quantities on the junction width is observed. Assuming a general-type relation between the spatial derivative of the phase and the spatial variation of the magnetic field along the plane of the junction, we derive a scaling relation between the measured quantities depending on the junction width. The derived relation is consistent with the experimental data.

DOI: 10.1109/77.783894
Zitationen: 19
Web of Science
Zitationen: 16
Zitationen: 17
Zugehörige Institution(en) am KIT Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 1999
Sprache Englisch
Identifikator ISSN: 1051-8223, 1558-2515
KITopen-ID: 1000074492
Erschienen in IEEE transactions on applied superconductivity
Verlag Institute of Electrical and Electronics Engineers (IEEE)
Band 9
Heft 2
Seiten 3957-3961
Nachgewiesen in Scopus
Web of Science
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