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Diffraction symmetry of binary Fourier elements with feature sizes on the order of the illumination wavelength and effects of fabrication errors

Nguyen, Giang-Nam; Heggarty, Kevin; Meur, Julien Le; Bacher, Andreas 1; Meyrueis, Patrick
1 Institut für Mikrostrukturtechnik (IMT), Karlsruher Institut für Technologie (KIT)

Abstract (englisch):

When building spot array binary Fourier diffractive optical elements (DOEs) having feature sizes on the order of the wavelength, we noticed remarkable variations in the experimental diffraction efficiency compared to the simulation results. Even with the use of high-cost electron beam lithography and rigorous Fourier modal method simulations, there appear to be no publications, to the best of our knowledge, showing close agreement in diffraction efficiency between the simulation and experimental results. In this Letter, we show that the diffraction symmetry of binary Fourier DOEs can be an efficient and consistent metric for evaluating the limit of the thin-element approximation and the effects of fabrication errors.

DOI: 10.1364/OL.42.005178
Zitationen: 5
Web of Science
Zitationen: 5
Zitationen: 4
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2017
Sprache Englisch
Identifikator ISSN: 0146-9592, 1539-4794
KITopen-ID: 1000077347
HGF-Programm 49.01.06 (POF III, LK 02) E-Beam Lithography
Erschienen in Optics letters
Verlag Optica Publishing Group (OSA)
Band 42
Heft 24
Seiten 5178-5181
Bemerkung zur Veröffentlichung
Nachgewiesen in Dimensions
Web of Science
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