KIT | KIT-Bibliothek | Impressum
DOI: 10.1016/j.mee.2017.11.004

Soft thermal nanoimprint of PMMA doped with upconverter nanoparticles

Hauser, Hubert; Herter, Barbara; Hofmann, Clarissa L.M.; Höhn, Oliver; Kübler, Volker; Fischer, Stefan; Wolf, Sebastian; Fasold, Stefan; van Veggel, Frank C.J.M.; Goldschmidt, Jan Christoph; Bläsi, Benedikt

Abstract (englisch):
Upconversion of low-energy photons into higher energy photons is a non-linear effect that can be strongly enhanced by increasing the intensity of impinging light. Such an enhanced intensity can also be achieved by near-field optical effects in photonic structures. In this paper, we investigate photonic structures in the form of linear gratings with varying periods realised in poly-methyl-methacrylate (PMMA) layers using soft stamps in a thermal nanoimprint process. Master structures were fabricated using e-beam lithography and reactive ion etching in silicon. These master structures were replicated into bi-layer polydimethylsiloxane (PDMS) stamps. PMMA layers with embedded β-NaYF4:25% Er3 + upconverter nanoparticles were applied to glass substrates using spin coating. The PDMS stamps were used to imprint the PMMA layer with very accurate pattern fidelity. The upconversion luminescence around 980 nm was enhanced more than three times by the photonic structure under 1523 nm laser excitation with 0.43 ± 0.02 W/cm2 irradiance, in comparison to a reference sample containing the same amount of upconverter material.

Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Publikationstyp Zeitschriftenaufsatz
Jahr 2017
Sprache Englisch
Identifikator ISSN: 0167-9317, 1873-5568
KITopen ID: 1000077876
HGF-Programm 43.23.04; LK 01
Erschienen in Microelectronic engineering
Band 187-188
Seiten 154-159
Vorab online veröffentlicht am 03.11.2017
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft KITopen Landing Page