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Strategy for tailoring the size distribution of nanospheres to optimize rough backreflectors of solar cells

Nanz, Stefan 1; Abass, Aimi 2; Piechulla, Peter M.; Sprafke, Alexander; Wehrspohn, Ralf B.; Rockstuhl, Carsten 1,2
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)


We study the light-trapping properties of surface textures generated by a bottom-up approach, which utilizes monolayers of densely deposited nanospheres as a template. We demonstrate that just allowing placement disorder in monolayers from identical nanospheres can already lead to a significant boost in light-trapping capabilities. Further absorption enhancement can be obtained by involving an additional nanosphere size species. We show that the Power Spectral Density provides limited correspondence to the diffraction pattern and in turn to the short-circuit current density enhancement for large texture modulations. However, in predicting the optimal nanosphere size distribution, we demonstrate that full-wave simulations of just a c-Si semi-infinite halfspace at a single wavelength in the range where light trapping is of main importance is sufficient to provide an excellent estimate. The envisioned bottom-up approach can thus reliably provide good light-trapping surface textures even with simple nanosphere monolayer templates defined by a limited number of control parameters: two nanosphere radii and their occurrence probability.

Verlagsausgabe §
DOI: 10.5445/IR/1000078609
Veröffentlicht am 10.01.2018
DOI: 10.1364/OE.26.00A111
Zitationen: 11
Web of Science
Zitationen: 10
Zitationen: 11
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2018
Sprache Englisch
Identifikator ISSN: 1094-4087
KITopen-ID: 1000078609
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Optics express
Verlag Optica Publishing Group (OSA)
Band 26
Heft 2
Seiten A111-A123
Nachgewiesen in Dimensions
Web of Science
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