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At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis

Zdora, Marie-Christine; Zanette, Irene; Zhou, Tunhe; Koch, Frieder J.; Romell, Jenny; Sala, Simone; Last, Arndt; Ohishi, Yasuo; Hirao, Naohisa; Rau, Christoph; Thibault, Pierre

The current advances in new generation X-ray sources are calling for the development
and improvement of high-performance optics. Techniques for high-sensitivity phase sensing
and wavefront characterisation, preferably performed at-wavelength, are increasingly required
for quality control, optimisation and development of such devices. We here show that the
recently proposed unified modulated pattern analysis (UMPA) can be used for these purposes.
We characterised two polymer X-ray refractive lenses and quantified the effect of beam damage
and shape errors on their refractive properties. Measurements were performed with two different
setups for UMPA and validated with conventional X-ray grating interferometry. Due to its
adaptability to different setups, the ease of implementation and cost-effectiveness, we expect
UMPA to find applications for high-throughput quantitative optics characterisation and wavefront

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Verlagsausgabe §
DOI: 10.5445/IR/1000080543
Veröffentlicht am 08.03.2018
DOI: 10.1364/OE.26.004989
Zitationen: 2
Web of Science
Zitationen: 1
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Publikationstyp Zeitschriftenaufsatz
Jahr 2018
Sprache Englisch
Identifikator ISSN: 1094-4087
KITopen-ID: 1000080543
HGF-Programm 43.23.02 (POF III, LK 01)
Erschienen in Optics express
Band 26
Heft 4
Seiten 4989-5004
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