KIT | KIT-Bibliothek | Impressum | Datenschutz

Defect generation in Pd layers by ‘smart’ films with high H-affinity

Burlaka, Vladimir; Roddatis, Vladimir; Bongers, Marian David; Pundt, Astrid

In this paper, we demonstrate that the microstructure and the surface of a thin palladium (Pd) film can be intentionally altered by the presence of a subjacent niobium (Nb) film. Depending on the thickness of the Nb film and on the hydrogen gas pressure, defects in the Pd film can be healed or created. To demonstrate this effect, Pd/Nb/sapphire (Al₂O₃) stacks are studied during hydrogen gas exposure at room temperature by using scanning tunneling microscopy (STM), X-ray diffraction (XRD) and environmental transmission electron microscopy (ETEM). STM shows that hydrogen-induced topography changes in the Nb films depend on the film thickness which affects the height of the Nb surface corrugations, their lateral size and distribution. XRD measurements show that these changes in the Nb hydride film influence the microstructure of the overlaying Pd film. ETEM reveals that the modifications of the Pd film occur due to the precipitation and growth of the Nb hydride phase. The appearance of new defects, interface and surface roughening is observed in the Pd film above locally grown Nb hydride grains. These results can open a new route to de ... mehr

Open Access Logo

Verlagsausgabe §
DOI: 10.5445/IR/1000084799
Veröffentlicht am 29.10.2018
DOI: 10.1038/s41598-017-09900-z
Zitationen: 2
Web of Science
Zitationen: 2
Seitenaufrufe: 33
seit 22.08.2018
Downloads: 16
seit 03.11.2018
Zugehörige Institution(en) am KIT Institut für Angewandte Materialien - Werkstoffkunde (IAM-WK)
Publikationstyp Zeitschriftenaufsatz
Jahr 2017
Sprache Englisch
Identifikator ISSN: 2045-2322
KITopen-ID: 1000084799
Erschienen in Scientific reports
Band 7
Heft 1
Seiten Art. Nr.: 9564
Nachgewiesen in Web of Science
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page