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Verlagsausgabe
DOI: 10.5445/IR/1000084983
Veröffentlicht am 01.08.2018

Adding chemically selective subtraction to multi-material 3D additive manufacturing

Gräfe, David; Wickberg, Andreas; Zieger, Markus Michael; Wegener, Martin; Blasco, Eva; Barner-Kowollik, Christopher

Abstract:
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation of 3D printed microstructures under mild conditions. Three bifunctional silane crosslinkers carrying various substitutions on the silicon atom are synthesized. The photoresists are prepared by mixing these silane crosslinkers with pentaerythritol triacrylate and a two-photon photoinitiator. The presence of pentaerythritol triacrylate significantly enhances the direct laser written structures with regard to resolution, while the microstructures remain cleavable. For the targeted cleavage of the fabricated 3D microstructures, simply a methanol solution including inorganic salts is required, highlighting the mild cleavage conditions. Critically, the photoresists can be cleaved selectively, which enables the sequential degradation of direct laser written structures and allows for subtractive manufacturing at the micro- and nanoscale.


Zugehörige Institution(en) am KIT Institut für Biologische Grenzflächen (IBG)
Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Institut für Technische Chemie und Polymerchemie (ITCP)
Publikationstyp Zeitschriftenaufsatz
Jahr 2018
Sprache Englisch
Identifikator ISSN: 2041-1723
URN: urn:nbn:de:swb:90-849832
KITopen ID: 1000084983
HGF-Programm 43.23.01; LK 01
Erschienen in Nature Communications
Band 9
Heft 1
Seiten 2788/1-6
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Vorab online veröffentlicht am 17.07.2018
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