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Experimental demonstration of spectrally broadband Huygens sources using low-index spheres

Abdelrahman, Mohamed Ismail 1; Saleh, Hassan; Fernandez-Corbaton, Ivan ORCID iD icon 2; Gralak, Boris; Geffrin, Jean-Michel; Rockstuhl, Carsten 1,2
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)


Manipulating the excitation of resonant electric and magnetic multipole moments in structured dielectric media has unlocked many sophisticated electromagnetic functionalities. This invited article demonstrates the experimental realization of a broadband Huygens’ source. This Huygens’ source consists of a spherical particle that exhibits a well-defined forward-scattering pattern across more than an octave-spanning spectral band at GHz frequencies, where the scattering in the entire backward hemisphere is suppressed. Two different low-index nonmagnetic spheres are studied that differ in their permittivity. This causes them to offer a different shape for the forward-scattering pattern. The theoretical understanding of this broadband feature is based on the approximate equality of the resonant electric and magnetic multipole moments in both amplitude and phase in low permittivity spheres. This is a key condition to approximate the electromagnetic duality symmetry which, together with the spherical symmetry, suppresses the backscattering. With such a configuration, broadband Huygens’ sources can be designed even if magnetic materials are unavailable. ... mehr

Verlagsausgabe §
DOI: 10.5445/IR/1000090906
Veröffentlicht am 12.02.2019
DOI: 10.1063/1.5080980
Zitationen: 17
Web of Science
Zitationen: 18
Zitationen: 19
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Publikationstyp Zeitschriftenaufsatz
Publikationsmonat/-jahr 02.2019
Sprache Englisch
Identifikator ISSN: 2378-0967
KITopen-ID: 1000090906
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in APL photonics
Verlag American Institute of Physics (AIP)
Band 4
Heft 2
Seiten Article: 020802
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Nachgewiesen in Scopus
Web of Science
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