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Load sensitive stable current source for complex precision pulsed electroplating

Nassar, Omar; Meissner, Markus V.; Wadhwa, Sagar; Korvink, Jan G.; Mager, Dario

Abstract:
Electrodeposition is a highly versatile and well explored technology. However, it also depends strongly on the experience level of the operator. This experience includes the pretreatment of the sample, and the composition of the electrolyte settings of the plating parameters. Accurate control over the electroplating current is needed especially for the formation of small structures, where pulsed electrodeposition has proven to reduce many unwanted effects. To bring precision into the formation of optimal recipes, a highly flexible current source based on a microcontroller was developed. It allows a large variety of pulse waveforms, as well as maintaining a feedback loop that controls the current and monitors the output voltage, allowing for both galvanostatic (current driven) and potentiostatic (voltage driven) electrodeposition. The system has been implemented with multiple channels, permitting the simultaneous electrodeposition of multiple substrates in parallel. Being based on a microcomputer, the system can be programmed using predefined recipes individually for each channel, or even adapt the recipes during plating. All measurement values are continuously recorded for the purpose of documentation and diagnosis. ... mehr

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Verlagsausgabe §
DOI: 10.5445/IR/1000098854
Veröffentlicht am 10.10.2019
Coverbild
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Publikationstyp Zeitschriftenaufsatz
Jahr 2019
Sprache Englisch
Identifikator ISSN: 0034-6748, 1089-7623
KITopen-ID: 1000098854
HGF-Programm 43.22.01 (POF III, LK 01)
Erschienen in Review of scientific instruments
Band 90
Heft 10
Seiten Article: 104704
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