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Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping

Grünewald, Lukas ORCID iD icon 1; Gerthsen, Dagmar 1; Hettler, Simon 1
1 Laboratorium für Elektronenmikroskopie (LEM), Karlsruher Institut für Technologie (KIT)


Background: Electron-beam shaping opens up the possibility for novel imaging techniques in scanning (transmission) electron microscopy (S(T)EM). Phase-modulating thin-film devices (phase masks) made of amorphous silicon nitride are commonly used to generate a wide range of different beam shapes. An additional conductive layer on such a device is required to avoid charging under electron-beam irradiation, which induces unwanted scattering events.
Results: Phase masks of conductive amorphous carbon (aC) were successfully fabricated with optical lithography and focused ion beam milling. Analysis by TEM shows the successful generation of Bessel and vortex beams. No charging or degradation of the aC phase masks was observed.
Conclusion: Amorphous carbon can be used as an alternative to silicon nitride for phase masks at the expense of a more complex fabrication process. The quality of arbitrary beam shapes could benefit from the application of phase masks made of amorphous C.

Verlagsausgabe §
DOI: 10.5445/IR/1000099821
Veröffentlicht am 13.11.2019
DOI: 10.3762/bjnano.10.128
Zitationen: 5
Zitationen: 5
Cover der Publikation
Zugehörige Institution(en) am KIT Laboratorium für Elektronenmikroskopie (LEM)
Universität Karlsruhe (TH) – Zentrale Einrichtungen (Zentrale Einrichtungen)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2019
Sprache Englisch
Identifikator ISSN: 2190-4286
KITopen-ID: 1000099821
Erschienen in Beilstein journal of nanotechnology
Verlag Beilstein-Institut
Band 10
Seiten 1290–1302
Vorab online veröffentlicht am 25.06.2019
Schlagwörter amorphous carbon, Bessel beam, electron-beam shaping, nanofabrication, vortex beam
Nachgewiesen in Dimensions
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