KIT | KIT-Bibliothek | Impressum | Datenschutz

Structure Quality of LuFeO3 Epitaxial Layers Grown by Pulsed-Laser Deposition on Sapphire/Pt

Bauer, Sondes; Rodrigues, Adriana; Horák, Lukáš; Jin, Xiaowei; Schneider, Reinhard; Baumbach, Tilo; Holý, Václav

Abstract:
Structural quality of LuFeO$_{3}$ epitaxial layers grown by pulsed-laser deposition on sapphire substrates with and without platinum Pt interlayers has been investigated by in situ high-resolution X-ray diffraction (reciprocal-space mapping). The parameters of the structure such as size and misorientation of mosaic blocks have been determined as functions of the thickness of LuFeO$_{3}$ during growth and for different thicknesses of platinum interlayers up to 40 nm. By means of fitting of the time-resolved X-ray reflectivity curves and by in situ X-ray diffraction measurement, we demonstrate that the LuFeO$_{3}$ growth rate as well as the out-of-plane lattice parameter are almost independent from Pt interlayer thickness, while the in-plane LuFeO$_{3}$ lattice parameter decreases. We reveal that, despite the different morphologies of the Pt interlayers with different thickness, LuFeO3 was growing as a continuous mosaic layer and the misorientation of the mosaic blocks decreases with increasing Pt thickness. The X-ray diffraction results combined with ex situ scanning electron microscopy and high-resolution transmission electron microscopy demonstrate that the Pt interlayer significantly improves the structure of LuFeO$_{3}$ by reducing the misfit of the LuFeO$_{3}$ lattice with respect to the material underneath.

Open Access Logo


Verlagsausgabe §
DOI: 10.5445/IR/1000104660
Veröffentlicht am 14.02.2020
Cover der Publikation
Zugehörige Institution(en) am KIT Laboratorium für Elektronenmikroskopie (LEM)
Institut für Photonenforschung und Synchrotronstrahlung (IPS)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 1996-1944
KITopen-ID: 1000104660
HGF-Programm 56.03.20 (POF III, LK 01)
Nanoscience a.Material f.Inform.Technol.
Erschienen in Materials
Band 13
Heft 1
Seiten Art. Nr.: 61
Vorab online veröffentlicht am 21.12.2019
Schlagwörter pulsed-laser deposition, in situ X-ray diffraction, electron microscopy, multiferroics
Nachgewiesen in Web of Science
Scopus
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page