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It’s in the Fine Print: Erasable Three-Dimensional Laser-Printed Micro- and Nanostructures

Gräfe, David; Walden, Sarah L.; Blinco, James; Wegener, Martin 1; Blasco, Eva 2; Barner-Kowollik, Christopher 2
1 Institut für Angewandte Physik (APH), Karlsruher Institut für Technologie (KIT)
2 Institut für Technische Chemie und Polymerchemie (ITCP), Karlsruher Institut für Technologie (KIT)

Abstract:

3D printing, on all scales, is currently a vibrant topic in scientific and industrial research as it has enormous potential to radically change manufacturing. Owing to the inherent nature of the manufacturing process, 3D printed structures may require additional material to structurally support complex features. Such support material must be removed after printing—sometimes termed subtractive manufacturing—without adversely affecting the remaining structure. An elegant solution is the use of photoresists containing labile bonds that allow for controlled cleavage with specific triggers. Herein, we explore state‐of‐the‐art cleavable photoresists for 3D direct laser writing, as well as their potential to combine additive and subtractive manufacturing in a hybrid technology. We discuss photoresist design, feature resolution, cleavage properties, and current limitations of selected examples. Furthermore, we share our perspective on possible labile bonds, and their corresponding cleavage trigger, which we believe will have a critical impact on future applications and expand the toolbox of available cleavable photoresists.


Verlagsausgabe §
DOI: 10.5445/IR/1000105678
Veröffentlicht am 09.03.2021
Originalveröffentlichung
DOI: 10.1002/anie.201910634
Scopus
Zitationen: 17
Web of Science
Zitationen: 19
Dimensions
Zitationen: 20
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Institut für Technische Chemie und Polymerchemie (ITCP)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 16.04.2020
Sprache Englisch
Identifikator ISSN: 0570-0833, 1433-7851, 1521-3757, 1521-3773
KITopen-ID: 1000105678
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Angewandte Chemie / International edition
Verlag Wiley-VCH Verlag
Band 59
Heft 16
Seiten 6330–6340
Vorab online veröffentlicht am 21.11.2019
Nachgewiesen in Web of Science
Dimensions
Scopus
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