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Minimalist Mie coefficient model

Rahimzadegan, A. ORCID iD icon 1; Alaee, R.; Rockstuhl, C. 1,2; Boyd, R. W.
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)


When considering light scattering from a sphere, the ratios between the expansion coefficients of the scattered and the incident field in a spherical basis are known as the Mie coefficients. Generally, Mie coefficients depend on many degrees of freedom, including the dimensions and electromagnetic properties of the spherical object. However, for fundamental research, it is important to have easy expressions for all possible values of Mie coefficients within the existing physical constraints and which depend on the least number of degrees of freedom. While such expressions are known for spheres made from non-absorbing materials, we present here, for the first time to our knowledge, corresponding expressions for spheres made from absorbing materials. To illustrate the usefulness of these expressions, we investigate the upper bound for the absorption cross section of a trimer made from electric dipolar spheres. Given the results, we have designed a dipolar ITO trimer that offers a maximal absorption cross section. Our approach is not limited to dipolar terms, but indeed, as demonstrated in the manuscript, can be applied to higher order terms as well. ... mehr

Verlagsausgabe §
DOI: 10.5445/IR/1000120562
Veröffentlicht am 23.07.2020
DOI: 10.1364/OE.390331
Zitationen: 15
Zitationen: 14
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 1094-4087
KITopen-ID: 1000120562
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Optics express
Verlag Optica Publishing Group (OSA)
Band 28
Heft 11
Seiten 16511-16525
Nachgewiesen in Scopus
Web of Science
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