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Influence of Co bilayers and trilayers on the plasmon-driven light emission from Cu(111) in a scanning tunneling microscope

Edelmann, Kevin 1; Wilmes, Lars 1; Rai, Vibhuti ORCID iD icon 1; Gerhard, Lukas 1; Yang, Liang 1,2; Wegener, Martin 1,2; Repän, Taavi 1; Rockstuhl, Carsten 1; Wulfhekel, Wulf 1
1 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)
2 Institut für Angewandte Physik (APH), Karlsruher Institut für Technologie (KIT)


Light emission from the gap cavity formed by the tip of a scanning tunneling microscope (STM) and a flat metallic sample allows us to probe the dielectric response of metals at the atomic scale and presents a way to distinguish between different materials. The excitation mechanism of the charge carrier oscillations, which ultimately decay into light, is linked to inelastic electron tunneling as opposed to the mostly semiclassical picture of the electromagnetic resonance of the gap cavity. Thus, the observed light emission does not only reflect the electromagnetic resonance of the cavity but also involves the electronic density of states. In this paper, we compare light emission from Cu(111) and Co nanoislands on Cu(111). We find a strong intensity contrast but almost no alteration of the resonance wavelength except close to step edges. Our results show that the light emission from the STM junction is highly sensitive to a few atomic layers of alien material mostly due to the dielectric properties of the layer.

Verlagsausgabe §
DOI: 10.5445/IR/1000120785
Veröffentlicht am 20.12.2021
DOI: 10.1103/PhysRevB.101.205405
Zitationen: 5
Zitationen: 5
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Institut für QuantenMaterialien und Technologien (IQMT)
Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 2469-9950, 2469-9969
KITopen-ID: 1000120785
HGF-Programm 43.21.02 (POF III, LK 01) Quantum Properties of Nanostructures
Weitere HGF-Programme 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Physical review / B
Verlag American Physical Society (APS)
Band 101
Heft 20
Seiten Art.Nr. 205405
Vorab online veröffentlicht am 05.05.2020
Nachgewiesen in Web of Science
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