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Fully Printed Inverters using Metal‐Oxide Semiconductor and Graphene Passives on Flexible Substrates

Singaraju, Surya Abhishek 1; Marques, Gabriel Cadilha 1; Gruber, Patric 2; Kruk, Robert 1; Hahn, Horst 1; Breitung, Ben 1,3; Aghassi-Hagmann, Jasmin ORCID iD icon 1
1 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)
2 Institut für Angewandte Materialien - Werkstoff- und Biomechanik (IAM-WBM), Karlsruher Institut für Technologie (KIT)
3 Karlsruhe Nano Micro Facility (KNMF), Karlsruher Institut für Technologie (KIT)

Abstract:

Printed and flexible metal‐oxide transistor technology has recently demonstrated great promise due to its high performance and robust mechanical stability. Herein, fully printed inverter structures using electrolyte‐gated oxide transistors on a flexible polyimide (PI) substrate are discussed in detail. Conductive graphene ink is printed as the passive structures and interconnects. The additive printed transistors on PI substrates show an 𝐼$_{on}$/𝐼$_{off}$ ratio of 10$^{6}$ and show mobilities similar to the state‐of‐the‐art printed transistors on rigid substrates. Printed meander structures of graphene are used as pull‐up resistances in a transistor–resistor logic to create fully printed inverters. The printed and flexible inverters show a signal gain of 3.5 and a propagation delay of 30 ms. These printed inverters are able to withstand a tensile strain of 1.5% following more than 200 cycles of mechanical bending. The stability of the electrical direct current (DC) properties has been observed over a period of 5 weeks. These oxide transistor‐based fully printed inverters are relevant for digital printing methods which could be implemented into roll‐to‐roll processes.


Verlagsausgabe §
DOI: 10.5445/IR/1000122021
Veröffentlicht am 24.07.2020
Originalveröffentlichung
DOI: 10.1002/pssr.202000252
Scopus
Zitationen: 9
Web of Science
Zitationen: 8
Dimensions
Zitationen: 8
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Materialien - Werkstoff- und Biomechanik (IAM-WBM)
Institut für Nanotechnologie (INT)
Karlsruhe Nano Micro Facility (KNMF)
Publikationstyp Zeitschriftenaufsatz
Publikationsmonat/-jahr 09.2020
Sprache Englisch
Identifikator ISSN: 1862-6254, 1862-6270
KITopen-ID: 1000122021
HGF-Programm 43.22.03 (POF III, LK 01) Printed Materials and Systems
Erschienen in Physica status solidi / Rapid research letters
Verlag John Wiley and Sons
Band 14
Heft 9
Seiten Art.Nr. 2000252
Vorab online veröffentlicht am 22.06.2020
Nachgewiesen in Dimensions
Scopus
Web of Science
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