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3D Two-Photon Microprinting of Nanoporous Architectures

Mayer, F.; Ryklin, D.; Wacker, I.; Curticean, R.; Čalkovský, M.; Niemeyer, A.; Dong, Z.; Levkin, P. A.; Gerthsen, D.; Schröder, R. R.; Wegener, M.

A photoresist system for 3D two‐photon microprinting is presented, which enables the printing of inherently nanoporous structures with mean pore sizes around 50 nm by means of self‐organization on the nanoscale. A phase separation between polymerizable and chemically inert photoresist components leads to the formation of 3D co‐continuous structures. Subsequent washing‐out of the unpolymerized phase reveals the porous polymer structures. To characterize the volume properties of the printed structures, scanning electron microscopy images are recorded from ultramicrotome sections. In addition, the light‐scattering properties of the 3D‐printed material are analyzed. By adjusting the printing parameters, the porosity can be controlled during 3D printing. As an application example, a functioning miniaturized Ulbricht light‐collection sphere is 3D printed and tested.

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Verlagsausgabe §
DOI: 10.5445/IR/1000122747
Veröffentlicht am 22.09.2020
DOI: 10.1002/adma.202002044
Zitationen: 9
Zitationen: 12
Cover der Publikation
Zugehörige Institution(en) am KIT 3D Matter Made to Order (3DMM2O)
Institut für Angewandte Physik (APH)
Institut für Biologische und Chemische Systeme (IBCS)
Institut für Nanotechnologie (INT)
Laboratorium für Elektronenmikroskopie (LEM)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 13.08.2020
Sprache Englisch
Identifikator ISSN: 0935-9648, 1521-4095
KITopen-ID: 1000122747
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Weitere HGF-Programme 47.01.01 (POF III, LK 01) Biol.Netzwerke u.Synth.Regulat. ITG+ITC
Erschienen in Advanced materials
Verlag John Wiley and Sons
Band 32
Heft 32
Seiten Art. Nr.: 2002044
Vorab online veröffentlicht am 30.06.2020
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