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Sensitive Photoresists for Rapid Multiphoton 3D Laser Micro- and Nanoprinting

Kiefer, P.; Hahn, V.; Nardi, M.; Yang, L.; Blasco, E.; Barner-Kowollik, C.; Wegener, M.

Driven by recent advances in rapid multiphoton single‐focus 3D laser nanoprinting, multifocus variants thereof, and projection‐based multiphoton 3D laser nanoprinting, the necessary average total laser powers from femtosecond laser oscillators or even from amplified femtosecond laser systems have exceeded the Watt level. Aiming at ever faster 3D printing, there exist two options: Using yet more powerful lasers or searching for more sensitive photoresists allowing for higher speeds at comparable or lower power levels. Here, altogether more than 70 different photoresists from the literature and a few new candidates are reviewed with regard to effective multiphoton sensitivity. A dimensionless sensitivity figure‐of‐merit allows to directly compare data taken under sometimes vastly different conditions.

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Verlagsausgabe §
DOI: 10.5445/IR/1000123608
Veröffentlicht am 27.09.2020
DOI: 10.1002/adom.202000895
Zitationen: 1
Web of Science
Zitationen: 1
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Physik (APH)
Institut für Technische Chemie und Polymerchemie (ITCP)
Institut für Nanotechnologie (INT)
3D Matter Made to Order (3DMM2O)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 2195-1071
KITopen-ID: 1000123608
Erschienen in Advanced optical materials
Vorab online veröffentlicht am 26.08.2020
Nachgewiesen in Scopus
Web of Science
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