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Sensitive Photoresists for Rapid Multiphoton 3D Laser Micro- and Nanoprinting

Kiefer, P.; Hahn, V.; Nardi, M.; Yang, L.; Blasco, E.; Barner-Kowollik, C.; Wegener, M.

Abstract:
Driven by recent advances in rapid multiphoton single‐focus 3D laser nanoprinting, multifocus variants thereof, and projection‐based multiphoton 3D laser nanoprinting, the necessary average total laser powers from femtosecond laser oscillators or even from amplified femtosecond laser systems have exceeded the Watt level. Aiming at ever faster 3D printing, there exist two options: Using yet more powerful lasers or searching for more sensitive photoresists allowing for higher speeds at comparable or lower power levels. Here, altogether more than 70 different photoresists from the literature and a few new candidates are reviewed with regard to effective multiphoton sensitivity. A dimensionless sensitivity figure‐of‐merit allows to directly compare data taken under sometimes vastly different conditions.

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Verlagsausgabe §
DOI: 10.5445/IR/1000123608
Veröffentlicht am 27.09.2020
Originalveröffentlichung
DOI: 10.1002/adom.202000895
Scopus
Zitationen: 7
Dimensions
Zitationen: 9
Cover der Publikation
Zugehörige Institution(en) am KIT 3D Matter Made to Order (3DMM2O)
Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Institut für Technische Chemie und Polymerchemie (ITCP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 2195-1071
KITopen-ID: 1000123608
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in Advanced optical materials
Verlag John Wiley and Sons
Band 8
Heft 19
Seiten Art.-Nr.: 2000895
Vorab online veröffentlicht am 26.08.2020
Nachgewiesen in Dimensions
Web of Science
Scopus
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