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Modeling of Atmospheric-Pressure Dielectric Barrier Discharges in Argon with Small Admixtures of Tetramethylsilane

Loffhagen, D.; Becker, M. M.; Czerny, Andreas K.; Klages, C.-P.

Abstract:
A time-dependent, spatially one-dimensional fluid-Poisson model is applied to analyze the impact of small amounts of tetramethylsilane (TMS) as precursor on the discharge characteristics of an atmospheric-pressure dielectric barrier discharge (DBD) in argon. Based on an established reaction kinetics for argon, it includes a plasma chemistry for TMS, which is validated by measurements of the ignition voltage at the frequency f=86.2kHz for TMS amounts of up to 200 ppm. Details of both a reduced Ar-TMS reaction kinetics scheme and an extended plasma-chemistry model involving about 60 species and 580 reactions related to TMS are given. It is found that good agreement between measured and calculated data can be obtained, when assuming that 25% of the reactions of TMS with excited argon atoms with a rate coefficient of 3.0×10$^{−16}$m$^{3}$/s lead to the production of electrons due to Penning ionization. Modeling results for an applied voltage U$_{a,0}$=4kV show that TMS is depleted during the residence time of the plasma in the DBD, where the percentage consumption of TMS decreases with increasing TMS fraction because only a finite number of excited argon species is available to dissociate and/or ionize the precursor via energy transfer. ... mehr

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Verlagsausgabe §
DOI: 10.5445/IR/1000125470
Veröffentlicht am 03.11.2020
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Materialien - Angewandte Werkstoffphysik (IAM-AWP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 0272-4324, 1572-8986
KITopen-ID: 1000125470
Erschienen in Plasma chemistry and plasma processing
Vorab online veröffentlicht am 07.10.2020
Schlagwörter Dielectric barrier discharges; Tetramethylsilane; Numerical modeling; Plasma polymerization
Nachgewiesen in Scopus
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