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Surface-controlled reversal of the selectivity of halogen bonds

Tschakert, J.; Zhong, Q.; Martin-Jimenez, D.; Carracedo-Cosme, J.; Romero-Muñiz, C.; Henkel, P.; Schlöder, T.; Ahles, S.; Mollenhauer, D.; Wegner, H. A.; Pou, P.; Pérez, R.; Schirmeisen, A.; Ebeling, D.

Abstract:
Intermolecular halogen bonds are ideally suited for designing new molecular assemblies because of their strong directionality and the possibility of tuning the interactions by using different types of halogens or molecular moieties. Due to these unique properties of the halogen bonds, numerous areas of application have recently been identified and are still emerging. Here, we present an approach for controlling the 2D self-assembly process of organic molecules by adsorption to reactive vs. inert metal surfaces. Therewith, the order of halogen bond strengths that is known from gas phase or liquids can be reversed. Our approach relies on adjusting the molecular charge distribution, i.e., the σ-hole, by molecule-substrate interactions. The polarizability of the halogen and the reactiveness of the metal substrate are serving as control parameters. Our results establish the surface as a control knob for tuning molecular assemblies by reversing the selectivity of bonding sites, which is interesting for future applications.

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Verlagsausgabe §
DOI: 10.5445/IR/1000126490
Veröffentlicht am 23.11.2020
Originalveröffentlichung
DOI: 10.1038/s41467-020-19379-4
Scopus
Zitationen: 1
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 01.12.2020
Sprache Englisch
Identifikator ISSN: 2041-1723
KITopen-ID: 1000126490
HGF-Programm 43.21.04 (POF III, LK 01) Molecular Engineering
Erschienen in Nature Communications
Band 11
Heft 1
Seiten Art. Nr.: 5630
Vorab online veröffentlicht am 06.11.2020
Nachgewiesen in Scopus
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