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Energy-Based Plasmonicity Index to Characterize Optical Resonances in Nanostructures

Müller, Marvin M. ORCID iD icon 1; Kosik, M.; Pelc, M.; Bryant, G. W.; Ayuela, A.; Rockstuhl, Carsten 1,2; Słowik, K.
1 Institut für Theoretische Festkörperphysik (TFP), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)

Abstract:

Resonances sustained by plasmonic nanoparticles provide extreme electric field confinement and enhancement into the deep subwavelength domain for a plethora of applications. Recent progress in nanofabrication made it even possible to tailor the properties of nanoparticles consisting of only a few hundred atoms. These nanoparticles support both single-particle-like resonances and collective plasmonic charge density oscillations. Prototypical systems sustaining both features are graphene nanoantennas. In pushing the frontier of nanoscience, traditional identification, and classification of such resonances is at stake again. We show that in such nanostructures, the concerted electron cloud oscillation in real space does not necessarily come along with collective dynamics of conduction band electrons in energy space. This unveils an urgent need for a discussion of how a plasmon in nanostructures should be defined. Here, we propose to define it relying on energy space dynamics. The unambiguous identification of the plasmonic nature of a resonance is crucial to find out whether desirable plasmon-assisted features, such as frequency conversion processes, can be expected from a resonance. ... mehr


Postprint §
DOI: 10.5445/IR/1000126657
Veröffentlicht am 01.01.2022
Originalveröffentlichung
DOI: 10.1021/acs.jpcc.0c07964
Scopus
Zitationen: 12
Dimensions
Zitationen: 12
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Institut für Theoretische Festkörperphysik (TFP)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2020
Sprache Englisch
Identifikator ISSN: 1932-7447, 1932-7455
KITopen-ID: 1000126657
HGF-Programm 43.23.01 (POF III, LK 01) Advanced Optical Lithography+Microscopy
Erschienen in The journal of physical chemistry <Washington, DC> / C
Verlag American Chemical Society (ACS)
Band 124
Heft 44
Seiten 24331-24343
Nachgewiesen in Dimensions
Scopus
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