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An Overview of Ellipsometric Measurements for Nonplanar Surfaces

Chen, Chia-Wei

Abstract (englisch):
Ellipsometry is an optical method used for characterizing materials and thin films. The principle of ellipsometry is that it measures polarization
changes at a sample in a reflection or transmission configuration. However, the shape of the sample is limited to flat or nearly flat surfaces because ellipsometry is sensitive to the angle of incidence, tilt angle and the sample position (height). Even slight misalignment of the sample might lead to significant experimental errors. For large misalignment, the detector of the ellipsometer is not feasible to receive sufficient signals. There have been a few approaches for characterizing nonplanr surfaces by ellipsometry. This report gives an overview of these approaches for ellipsometric measurements of nonplanar surfaces.

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Verlagsausgabe §
DOI: 10.5445/IR/1000126692
Veröffentlicht am 30.11.2020
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Anthropomatik und Robotik (IAR)
Publikationstyp Proceedingsbeitrag
Publikationsjahr 2019
Sprache Englisch
Identifikator ISBN: 978-3-7315-1028-4
ISSN: 1863-6489
KITopen-ID: 1000126692
Erschienen in Proceedings of the 2019 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory. Ed.: J. Beyerer; T. Zander
Verlag KIT Scientific Publishing
Seiten 25-38
Serie Karlsruher Schriften zur Anthropomatik / Lehrstuhl für Interaktive Echtzeitsysteme, Karlsruher Institut für Technologie ; Fraunhofer-Inst. für Optronik, Systemtechnik und Bildauswertung IOSB Karlsruhe ; 45
Bemerkung zur Veröffentlichung Technical Report IES-2019-09
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