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Multi-Lens Array Full-Field X-ray Microscopy

Opolka, Alexander 1; Müller, Dominik; Fella, Christian; Balles, Andreas; Mohr, Jürgen 1; Last, Arndt 1
1 Institut für Mikrostrukturtechnik (IMT), Karlsruher Institut für Technologie (KIT)


X-ray full-field microscopy at laboratory sources for photon energies above 10 keV suffers from either long exposure times or low resolution. The photon flux is mainly limited by the objectives used, having a limited numerical aperture NA. We show that this can be overcome by making use of the cone-beam illumination of laboratory sources by imaging the same field of view (FoV) several times under slightly different angles using an array of X-ray lenses. Using this technique, the exposure time can be reduced drastically without any loss in terms of resolution. A proof-of-principle is given using an existing laboratory metal-jet source at the 9.25 keV Ga Kα-line and compared to a ray-tracing simulation of the setup.

Verlagsausgabe §
DOI: 10.5445/IR/1000136222
Veröffentlicht am 06.08.2021
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe Nano Micro Facility (KNMF)
Karlsruhe School of Optics & Photonics (KSOP)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 05.08.2021
Sprache Englisch
Identifikator ISSN: 2076-3417
KITopen-ID: 1000136222
HGF-Programm 43.35.01 (POF IV, LK 01) Platform for Correlative, In Situ & Operando Charakterizat.
Erschienen in Applied Sciences
Verlag MDPI
Band 11
Heft 16
Seiten Article: 7234
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Schlagwörter X-ray microscopy; full-field microscopy; compound refractive X-ray lenses; CRLs. KNMF 2017-018-019249 EBL XRL
Nachgewiesen in Scopus
Web of Science
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