KIT | KIT-Bibliothek | Impressum | Datenschutz

A Self‐Assembly Method for Tunable and Scalable Nano‐Stamps: A Versatile Approach for Imprinting Nanostructures

Donie, Yidenekachew J.; Yuan, Yingxuan; Allegro, Isabel ORCID iD icon; Schackmar, Fabian; Hossain, Ihteaz M.; Huber, Robert ORCID iD icon; Roger, Julie; Paetzold, Ulrich W. ORCID iD icon; Gomard, Guillaume; Lemmer, Uli

Abstract:

In nanoimprint lithography (NIL), the imprinting stamp's fabrication is still a significant cost factor among the consumables. Bottom-up lithography approaches based on a phase-separation of polymer blends can provide a cost-effective route for fabricating these stamps. Today's polymers used to prepare phase-separated nanostructures (PSN), however, exhibit low glass transition temperatures. As a result, the PSN are prone to in-plane stamp distortions in the presence of high imprinting pressure and temperature, limiting their practical relevance for NIL. Here, the realization of mechanically and thermally stable PSN-based imprinting stamps for NIL systems via a phase-separation of a homopolymer/inorganic–organic hybrid polymer blend is reported. It is demonstrated that these imprinting stamps are easily tunable and scalable by adjusting the formulation of homopolymer/hybrid polymer mixture and deposition conditions. Feature sizes in PSN ranging from a few μm down to 100 nm are achieved through an interplay of these factors. As demonstrations of the envisioned applications, the developed imprinting stamps are integrated into a roll-to-roll NIL system for patterning a polystyrene thin-film. ... mehr


Verlagsausgabe §
DOI: 10.5445/IR/1000140936
Veröffentlicht am 08.12.2021
Originalveröffentlichung
DOI: 10.1002/admt.202101008
Scopus
Zitationen: 5
Web of Science
Zitationen: 6
Dimensions
Zitationen: 5
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Mikrostrukturtechnik (IMT)
Universität Karlsruhe (TH) – Interfakultative Einrichtungen (Interfakultative Einrichtungen)
Karlsruhe School of Optics & Photonics (KSOP)
Lichttechnisches Institut (LTI)
Publikationstyp Zeitschriftenaufsatz
Publikationsmonat/-jahr 06.2022
Sprache Englisch
Identifikator ISSN: 2365-709X, 2365-709X
KITopen-ID: 1000140936
HGF-Programm 38.01.05 (POF IV, LK 01) Simulations, Theory, Optics and Analytics (STOA)
Erschienen in Advanced materials technologies
Verlag John Wiley and Sons
Band 7
Heft 6
Seiten Art.Nr.: 2101008
Vorab online veröffentlicht am 03.12.2021
Nachgewiesen in Dimensions
Web of Science
Scopus
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page