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Phonon confinement and interface lattice dynamics of ultrathin high-rare earth sesquioxide films: the case of Eu₂O₃ on YSZ(001)

Stankov, Svetoslav; Merkel, Dániel G.; Kalt, Jochen; Göttlicher, Jörg; Łażewski, Jan; Sternik, Małgorzata; Jochym, Paweł T.; Piekarz, Przemysław; Baumbach, Tilo; Chumakov, Aleksandr I.; Rüffer, Rudolf

Abstract (englisch):

The spatial confinement of atoms at surfaces and interfaces significantly alters the lattice dynamics of thin films, heterostructures and multilayers. Ultrathin films with high dielectric constants (high-k) are of paramount interest for applications as gate layers in current and future integrated circuits. Here we report a lattice dynamics study of high-k Eu$_{2}$O$_{3}$ films with thicknesses of 21.3, 2.2, 1.3, and 0.8 nm deposited on YSZ(001). The Eu-partial phonon density of states (PDOS), obtained from nuclear inelastic scattering, exhibits broadening of the phonon peaks accompanied by up to a four-fold enhancement of the number of low-energy states compared to the ab initio calculated PDOS of a perfect Eu$_{2}$O$_{3}$ crystal. Our analysis demonstrates that while the former effect reflects the reduced phonon lifetimes observed in thin films due to scattering from lattice defects, the latter phenomenon arises from an ultrathin EuO layer formed between the thin Eu$_{2}$O$_{3}$ film and the YSZ(001) substrate. Thus, our work uncovers another potential source of vibrational anomalies in thin films and multilayers, which has to be cautiously considered.


Verlagsausgabe §
DOI: 10.5445/IR/1000141058
Veröffentlicht am 13.12.2021
Originalveröffentlichung
DOI: 10.1039/D1NA00728A
Scopus
Zitationen: 2
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Zitationen: 2
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Photonenforschung und Synchrotronstrahlung (IPS)
Laboratorium für Applikationen der Synchrotronstrahlung (LAS)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2022
Sprache Englisch
Identifikator ISSN: 2516-0230
KITopen-ID: 1000141058
HGF-Programm 56.12.11 (POF IV, LK 01) Materials - Quantum, Complex and Functional
Erschienen in Nanoscale advances
Verlag Royal Society of Chemistry (RSC)
Band 4
Seiten 19-25
Bemerkung zur Veröffentlichung Gefördert durch den KIT-Publikationsfonds
Vorab online veröffentlicht am 07.12.2021
Nachgewiesen in Scopus
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