KIT | KIT-Bibliothek | Impressum | Datenschutz

Fabrication of High‐Quality Thin Single‐Crystal Diamond Membranes with Low Surface Roughness

Heupel, Julia ; Pallmann, Maximillian ORCID iD icon 1; Körber, Jonathan 2; Hunger, David ORCID iD icon 1,3,4; Reithmaier, Johann Peter; Popov, Cyril
1 Physikalisches Institut (PHI), Karlsruher Institut für Technologie (KIT)
2 Karlsruher Institut für Technologie (KIT)
3 Karlsruhe School of Optics & Photonics (KSOP), Karlsruher Institut für Technologie (KIT)
4 Institut für QuantenMaterialien und Technologien (IQMT), Karlsruher Institut für Technologie (KIT)

Abstract:

Certain aspects before and during the fabrication of single-crystal diamond (SCD) membranes are highlighted, which are decisive to obtain high-quality membranes with low surface roughness values around 0.2 nm on a small area scale. In addition to the requirements for the starting material, including a high planarity and a moderate surface roughness, the importance of cleaning processes to minimize particles and impurities before and during the structuring is emphasized. With the help of a planarization procedure, consisting of a combination of different Ar/Cl$_2$ recipes with low etch rates, surface defects like grooves due to polishing are minimized and smooth surfaces are acquired. Severe micromasking can be prevented by the application of a cyclic Ar/Cl$_2$ + O$_2$ recipe, allowing finally the fabrication of defect-minimized and planarized SCD membranes in the thickness range between few microns and a few hundred nanometers. The high quality of the structured SCD membranes is evidenced with a morphological as well as an optical characterization via fiber-based microcavity measurements.


Verlagsausgabe §
DOI: 10.5445/IR/1000151940
Veröffentlicht am 21.12.2022
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für QuantenMaterialien und Technologien (IQMT)
Karlsruhe School of Optics & Photonics (KSOP)
Physikalisches Institut (PHI)
Publikationstyp Zeitschriftenaufsatz
Publikationsdatum 21.02.2023
Sprache Englisch
Identifikator ISSN: 1862-6300, 1862-6319
KITopen-ID: 1000151940
HGF-Programm 47.12.04 (POF IV, LK 01) Quantum Networking
Erschienen in physica status solidi (a)
Verlag John Wiley and Sons
Band 220
Heft 4
Seiten Art.-Nr.: 2200465
Vorab online veröffentlicht am 17.10.2022
Schlagwörter etching, membranes, micro-masking, polishing damage, roughness reduction, single-crystal diamond
Nachgewiesen in Web of Science
Dimensions
Scopus
KIT – Die Forschungsuniversität in der Helmholtz-Gemeinschaft
KITopen Landing Page