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Photochemically Activated 3D Printing Inks: Current Status, Challenges, and Opportunities

Gauci, Steven C.; Vranic, Aleksandra 1; Blasco, Eva 2; Bräse, Stefan 1,3; Wegener, Martin 2,4; Barner-Kowollik, Christopher 2
1 Institut für Organische Chemie (IOC), Karlsruher Institut für Technologie (KIT)
2 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)
3 Institut für Biologische und Chemische Systeme (IBCS), Karlsruher Institut für Technologie (KIT)
4 Institut für Angewandte Physik (APH), Karlsruher Institut für Technologie (KIT)

Abstract (englisch):

3D printing with light is enabled by the photochemistry underpinning it. Without fine control over our ability to photochemically gate covalent bond formation by the light at a certain wavelength and intensity, advanced photoresists with functions spanning from on-demand degradability, adaptability, rapid printing speeds and tailored functionality are impossible to design. Herein, we critically assess recent advances in photoresist design for light-driven 3D printing applications and provide an outlook of the outstanding challenges and opportunities. We achieve this by classing the discussed photoresists in chemistries that function photoinitiator-free and those that require a photoinitiator to proceed. Such a taxonomy is based on the efficiency with which photons are able to generate covalent bonds, with each concept featuring distinct advantages and drawbacks.


Postprint §
DOI: 10.5445/IR/1000164901
Frei zugänglich ab 09.09.2024
Originalveröffentlichung
DOI: 10.1002/adma.202306468
Scopus
Zitationen: 2
Dimensions
Zitationen: 4
Cover der Publikation
Zugehörige Institution(en) am KIT IAP (IAP)
Institut für Angewandte Physik (APH)
Institut für Nanotechnologie (INT)
Institut für Organische Chemie (IOC)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2024
Sprache Englisch
Identifikator ISSN: 0935-9648, 1521-4095
KITopen-ID: 1000164901
HGF-Programm 43.32.02 (POF IV, LK 01) Designed Optical Materials
Erschienen in Advanced Materials
Verlag John Wiley and Sons
Band 36
Heft 3
Seiten Art.-Nr.: 2306468
Vorab online veröffentlicht am 08.09.2023
Schlagwörter Direct laser lithography, 3D Printing, Photochemistry, Photoresist, Photoinitiator
Nachgewiesen in Dimensions
Scopus
Web of Science
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