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Chemical Substrate Treatment for Improved Pressureless Silver Sintering Adhesion of Power Electronics Dies

Steiner, Felix ORCID iD icon 1; Wurst, Helge; Blank, Thomas ORCID iD icon 1
1 Institut für Prozessdatenverarbeitung und Elektronik (IPE), Karlsruher Institut für Technologie (KIT)

Abstract:

We investigated a method for increasing the adhesion of pressureless-sintered silver die attach layers to common copper surfaces using sulfuric acid. Surfaces of DCB-, AMB substrates, and oxygen-free copper lead frames were cleaned and etched with different sulfuric acid-based solutions. Dummy chips were sintered to the treated substrates and changes in adhesion were evaluated by shear tests. Visual inspection of the fracture surfaces after shear testing shows adhesive failure at the substrate-to-sintered layer interface. Yet, increases in mean shear strength from 30 MPa to up to 117 MPa were achieved with a standard deviation reduction from 9.3 MPa to 3.6 MPa, respectively.


Zugehörige Institution(en) am KIT Institut für Prozessdatenverarbeitung und Elektronik (IPE)
Publikationstyp Proceedingsbeitrag
Publikationsdatum 19.08.2022
Sprache Englisch
Identifikator ISBN: 978-3-8007-5757-2
ISSN: 0341-3934
KITopen-ID: 1000165333
Erschienen in CIPS 2022 : 12th International Conference on Integrated Power Electronics Systems : Proceedings : March, 15-17, 2022 Berlin, Germany
Veranstaltung 12th International Conference on Integrated Power Electronics Systems (2022), Berlin, 15.03.2022 – 17.03.2022
Verlag VDE Verlag
Seiten 409-413
Serie ETG-Fachbericht ; 165
Schlagwörter power electronics, silver sintering, substrate cleaning, substrate preparation
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