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Relevance of Platinum Underlayer Crystal Quality for the Microstructure and Magnetic Properties of the Heterostructures YbFeO$_3$/Pt/YSZ(111)

Bauer, Sondes 1; Nergis, Berkin; Jin, Xiaowei 2; Horák, Lukáš; Schneider, Reinhard; Holý, Václav; Seemann, Klaus ORCID iD icon 3; Baumbach, Tilo; Ulrich, Sven
1 Institut für Photonenforschung und Synchrotronstrahlung (IPS), Karlsruher Institut für Technologie (KIT)
2 Laboratorium für Elektronenmikroskopie (LEM), Karlsruher Institut für Technologie (KIT)
3 Institut für Angewandte Materialien – Angewandte Werkstoffphysik (IAM-AWP), Karlsruher Institut für Technologie (KIT)

Abstract:

The hexagonal ferrite h-YbFeO$_3$ grown on YSZ(111) by pulsed laser deposition is foreseen as a promising single multiferroic candidate where ferroelectricity and antiferromagnetism coexist for future applications at low temperatures. We studied in detail the microstructure as well as the temperature dependence of the magnetic properties of the devices by comparing the heterostructures grown directly on YSZ(111) (i.e., YbPt_Th0nm) with h-YbFeO$_3$ films deposited on substrates buffered with platinum Pt/YSZ(111) and in dependence on the Pt underlayer film thickness (i.e., YbPt_Th10nm, YbPt_Th40nm, YbPt_Th55nm, and YbPt_Th70nm). The goal was to deeply understand the importance of the crystal quality and morphology of the Pt underlayer for the h-YbFeO$_3$ layer crystal quality, surface morphology, and the resulting physical properties. We demonstrate the relevance of homogeneity, continuity, and hillock formation of the Pt layer for the h-YbFeO3 microstructure in terms of crystal structure, mosaicity, grain boundaries, and defect distribution. The findings of transmission electron microscopy and X-ray diffraction reciprocal space mapping characterization enable us to conclude that an optimum film thickness for the Pt bottom electrode is Th${_Pt}$ = 70 nm, which improves the crystal quality of h-YbFeO$_3$ films grown on Pt-buffered YSZ(111) in comparison with h-YbFeO$_3$ films grown on YSZ(111) (i.e., YbPt_Th0nm). ... mehr


Verlagsausgabe §
DOI: 10.5445/IR/1000172389
Veröffentlicht am 11.07.2024
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Angewandte Materialien – Angewandte Werkstoffphysik (IAM-AWP)
Institut für Photonenforschung und Synchrotronstrahlung (IPS)
Laboratorium für Elektronenmikroskopie (LEM)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2024
Sprache Englisch
Identifikator ISSN: 2079-4991
KITopen-ID: 1000172389
Erschienen in Nanomaterials
Verlag MDPI
Band 14
Heft 12
Seiten Art.-Nr.: 1041
Vorab online veröffentlicht am 17.06.2024
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