Phase formation, structure and properties of quaternary MAX phase thin films in the Cr-V-C-Al system: A combinatorial study

Tailoring of individual atomic layers via alloying to synthesize quaternary MAX phases allows for expanding their chemical diversity and fine-tuning of their properties. In this study, Cr-V/C/Al multilayered precursors were deposited via combinatorial magnetron sputtering, creating nanostructured architectures with periodic stacking of nanolayers and varying Cr:V ratios. Their phase transformation and underlying reaction mechanisms during subsequent thermal annealing in argon towards the prospective quaternary solid solution (CrV)n+1AlCn MAX phases formation was systematically studied. Crystallization of (CrV)2AlC starts at approximately 500°C, while growth of higher-ordered (CrV)4AlC3 is observed from 960°C. Notably, intergrowth of (CrV)2AlC and (CrV)4AlC3 structures with coherent interface suggests that (CrV)2AlC acts as template for nucleation of (CrV)4AlC3. Thermal stability and high-temperature oxidation tests found that (CrV)2AlC exhibits higher thermal stability compared to (CrV)4AlC3 and films with Cr72.7V27.3 displayed good oxidation resistance at 1000°C, forming a protective bilayer oxide scale consisting of (Cr,Al)2O3 and Al2O3.