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A Comprehensive Guide to Fully Inkjet‐Printed IGZO Transistors

Magnarin, Lorenzo 1; Breitung, Ben ORCID iD icon 1; Aghassi-Hagmann, Jasmin ORCID iD icon 1
1 Institut für Nanotechnologie (INT), Karlsruher Institut für Technologie (KIT)

Abstract:

In this concise review, the recent advancements in fully inkjet-printed (IJP) indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs) over the past years are discussed. IGZO has replaced hydrogenated amorphous silicon (a-Si:H) as the primary channel material for liquid-crystal display TFTs and has gained further attention due to the solution processability of IGZO inks. Despite the longstanding practice of printing IGZO for approximately fifteen years, the realization of fully inkjet-printed devices, including both dielectric and electrode components, represents a recent milestone in research, potentially heralding a cost-effective era for IGZO transistors. In this review, following an introductory exposition of IGZO, the focus is on the different ink formulations, currently deployed for solution-processed IGZO devices, the intricacies of the printing procedure involved are delineated, and ongoing research endeavors pertaining to the printing of dielectrics and electrodes for such devices are expounded upon.


Verlagsausgabe §
DOI: 10.5445/IR/1000176110
Veröffentlicht am 11.11.2024
Cover der Publikation
Zugehörige Institution(en) am KIT Institut für Nanotechnologie (INT)
Publikationstyp Zeitschriftenaufsatz
Publikationsjahr 2024
Sprache Englisch
Identifikator ISSN: 2199-160X
KITopen-ID: 1000176110
HGF-Programm 43.31.02 (POF IV, LK 01) Devices and Applications
Erschienen in Advanced Electronic Materials
Verlag John Wiley and Sons
Seiten Art.-Nr.: 2400478
Vorab online veröffentlicht am 22.10.2024
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